Steve Lenk Author
Subjects of specialization
Affiliation
quantum computation, semiconductor physics, lithography.
Department of Micro- and Nanoelectronic Systems, Institute of Micro- and Nanoelectronics, Faculty of Electrical Engineering and Information Technology, Technische Universit
Steve Lenk working in the Department of Micro- and Nanoelectronic Systems, Institute of Micro- and Nanoelectronics, Faculty of Electrical Engineering and Information Technology, Technische Universität Ilmenau, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany. Steve Lenk has an area of research interest in the field of quantum computation, semiconductor physics, lithography.
Research Article Open Access
Author(s): Steve Lenk, Marcus Kaestner, Claudia Lenk, Tihomir Angelov, Yana Krivoshapkina and Ivo W Rangelow
2D Simulation of Fowler-Nordheim Electron Emission in Scanning Probe Lithography
For the manufacturing of quantum computers it will be necessary to routinely fabricate devices with critical dimensions down to the single-digit nanometer range. Since the high-costs and belated development of extreme UV lithography, we are focused on scanning probe lithography (SPL) utilizing Fowler-Nordheim emitted electrons for patterning of molecular resist materials. Our method is similar to the electron beam lithography with special electron emitters, i.e. our nanotips, differing in the much lower energy of the emitted electrons and the possibility to work at ambien... view more»