Journal of Nuclear Energy Science & Power Generation TechnologyISSN: 2325-9809

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Commentary, J Nucl Ene Sci Power Generat Technol Vol: 2 Issue: 2

Plasma and Ion Sources Applications

Abdelrahman MM*
Accelerators & Ion Sources Department, Nuclear Research Center, Atomic
Energy Authority, P.O. Box: 13759, Inchas, Cairo, Egypt
Corresponding author : Abdelrahman MM
Accelerators & Ion Sources Department, Nuclear Research Center, Atomic Energy Authority, P.O. Box: 13759, Inchas, Cairo, Egypt
Tel: +201526584116
E-mail: [email protected]
Received: January 26, 2013 Accepted: February 05, 2013 Published: February 14, 2013
Citation: Abdelrahman MM (2013) Plasma and Ion Sources Applications. J Nucl Ene Sci Power Generat Technol 2:2 doi:10.4172/2325-9809.1000107

Abstract

Plasma and Ion Sources Applications

People are constantly searching for a technology that will offer greater results with fewer treatments and less downtime. In the world of physics the term “plasma” denotes an electrically conducting medium formed by a gas containing a mixture of roughly equal numbers of free positive and negative charges, in a “quasi-neutral” condition. It is produced when part of the atoms or molecules in the gas become ionized and are sometimes referred to as the fourth state of matter, distinct from the solid, liquid and gaseous states. Gas discharge plasmas are utilized in a variety of applications such as light sources, plasma display panels, lasers, etching of surfaces and deposition of thin layers in the semiconductor industry. In addition, uses are found in surface modification, deposition of protective coating, in analytical chemistry (for the analysis of mainly solid materials), biotechnological and environmental applications.

Keywords:

People are constantly searching for a technology that will offer greater results with fewer treatments and less downtime. In the world of physics the term “plasma” denotes an electrically conducting medium formed by a gas containing a mixture of roughly equal numbers of free positive and negative charges, in a “quasi-neutral” condition. It is produced when part of the atoms or molecules in the gas become ionized and are sometimes referred to as the fourth state of matter, distinct from the solid, liquid and gaseous states [1-5]. Gas discharge plasmas are utilized in a variety of applications such as light sources, plasma display panels, lasers, etching of surfaces and deposition of thin layers in the semiconductor industry. In addition, uses are found in surface modification, deposition of protective coating, in analytical chemistry (for the analysis of mainly solid materials), biotechnological and environmental applications [6,7]. In our lab, some applications of plasma as surface modifications, thin film formations for solar cell applications using silicon etched with aluminum recently showing a promising results and will be published very soon. Indeed, using oxygen plasma, a wood can be treated to protect from damage and can leave for a longer time.
Ion sources are devices for producing and delivering ion beams. Ion beams may be directly used from the source or after acceleration by a simple or complex accelerator structure. Ion sources may be classified according to the ion characteristics in sources of positive ions and sources of negative ions. There are plenty types of ion sources. The variety of the ion sources arises from the different ways of ion generation from solids, liquids and gases and also the variety of generating plasma such as DC discharge, arc discharge, RF discharge, microwave discharge and laser driven plasmas [1,5].
The ion source is important because its properties affect many parameters involved in forming an ion beam as well as the interaction between the beam and substrates in fabrication. A lot of new applications concerning ion beams, not only in research laboratories but also industry and medical therapy, have stimulated great interest in accelerated ion beams. Beams extraction and focusing are strongly influenced by the geometry of the electrode system and the plasma parameters inside the ion source chamber [8-10]. Two major types of ion sources, point (Focused ion beam) and volume plasma sources, have been developed to produce nanometer- resolution patterns. Focused ion beams have achieved widespread application in the fields of material science, biology, semiconductor industry [11], archaeology, lithography [12] and others.
Ion beam bombardment of a solid target causes a significant transformation to the structure and properties of the bombarded surface [13-15]. When a beam of energetic particles enters a solid, several processes are initiated in the area of interaction. The polymer materials are very important in medical applications because it has high biocompatibility, low toxicity and a range of mechanical properties that are similar to those of tissue materials; also it is important material in many industrial applications. Electron and ion beam equipment play a vital role in the semiconductor manufacturing and nanotechnology industries [16,17].

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