Prof. Clifford L. Henderson obtained his B.S. in Chemical Engineering from Georgia Tech and his M.S. and Ph.D. degrees from the University of Texas at Austin. He spent a short time with Motorola in their Advanced Products Research and Development Lab before returning to academia at Georgia Tech in 1998. His current research interests include: optical lithography, photoresist materials science, stereolithography, rapid prototyping and rapid manufacturing, polymer thin film science and technology, micro- and nanofabrication, and microelectronic/ optoeletronic/MEMS/NEMS devices. His research group focuses thematically on: (1) developing new materials and processes for micro- and nanofabrication, (2) developing a fundamental understanding of the physiochemical processes that occur in such materials and processes, and (3) developing models that can be used to describe, control, and design such systems. He has authored or coauthored over 100 papers and holds 6 patents in areas related to polymeric materials, lithography, and materials and methods for micro- and nanofabrication.

 Prof. Clifford L. Henderson's research interests include: Polymer ultra-thin films and advanced membranes Polymer synthesis and characterization Directed self-assembly of block copolymers Design of photoresists and related materials for high resolution patterning Materials and processes for nanofabrication and nanoelectronics Organic electronic materials including graphene Materials simulation and modeling Thin film science and technology